GP Plasma completes contract signing to acquire IP and assets from General Plasma Inc. 

GP Plasma has secured the assets of General Plasma Inc including its dual source PECVD deposition and linear ion etch technology.  GP Plasma will continue to support GPI's customers while expanding our technology portfolio to offer best in class technical capabilities for the new vacuum coating equipment and system retrofits.

UltraDep PECVD dual ion source

UltraDep In-line PECVD dual ion source

UltraDep PECVD (Plasma enhanced chemical vapor deposition) makes metal oxide and nitride films on large area substrates like sheets of glass and rolls of plastic or metal web.

High Deposition Rate​

High Quality Film

Superior Uniformity

Long Term Operation

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